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Spin Dryer in ISO Class 5 Cleanroom

Offering main image Spin-drying of wafers after DI water rinsing. Wafer size 150 mm; N₂ purge; processing of entire wafer cassettes (25 wafers) possible.

Name

Spin Dryer in ISO Class 5 Cleanroom

Home partner institution

Otto von Guericke University Magdeburg


Technical staff available

Yes

Remote access details

false

Equipment

SUPERCLEAN 1600, VERTEQ

Open access to updated information database

Yes

Online booking system details

manual calender app