PECVD (Plasma Enhanced Chemical Vapour Deposition) in ISO Class 5 Cleanroom

2-chamber PECVD with microwave heads. Substrate: 100 mm and 150 mm wafer. Gas supply lines: H2, PH3, B2H6, SiH4, SiH2Cl2, NH3, O2 and 3 heated liquid precursor lines with evaporators. Share on