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Hot Plate in ISO Class 5 Cleanroom

Thermal treatment of photoresist to cure it and drive out solvents from the resist. Wafer sizes up to 200 mm; Lift Pins; Proximity-Bake; N2 Purge; quick heat up; programmable heating ramp.

Name

Hot Plate in ISO Class 5 Cleanroom

Home partner institution

Otto von Guericke University Magdeburg


Technical staff available

Yes

Remote access details

false

Equipment

HP8TT, SUSS MicroTec SE

Open access to updated information database

Yes

Online booking system details

manual calender app