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Spin Coater in ISO Class 5 Cleanroom

Offering main image Applying photoresist to wafers by rotation or spin coating. Wafer sizes up to 200 mm; a large number of vacuum chucks for a wide variety of substrates flexibly adjustable coating position; adjustable edge bead removal.

Name

Spin Coater in ISO Class 5 Cleanroom

Home partner institution

Otto von Guericke University Magdeburg


Technical staff available

Yes

Remote access details

false

Equipment

Lab Spin 8, SUSS MicroTec SE

Open access to updated information database

Yes

Online booking system details

manual calender app