Skip to Content
  1. Research Infrastructures 2
  2. Spin Dryer in ISO Class 5 Cleanroom

Spin Dryer in ISO Class 5 Cleanroom

Offering main image Spin-drying of wafers after DI water rinsing. Wafer size 150 mm; N₂ purge; processing of entire wafer cassettes (25 wafers) possible.

Name

Spin Dryer in ISO Class 5 Cleanroom

Scientific domain

Microsystems Engineering


 

Nanotechnology


Keywords

MST


 

Semiconductor Technology


 

Cleaning Processes


 

Wet Processing Drying


Home partner institution

Otto von Guericke University Magdeburg


Website

https://www.ovgu.de/unimagdeburg/en/microtechnologysupportunit-p-131854.html

Technical staff available

Yes

Remote access details

false

Equipment

SUPERCLEAN 1600, VERTEQ

Open access to updated information database

Yes

Online booking system details

manual calender app