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  2. Wet Chemistry Benches in ISO Class 5 Cleanroom

Wet Chemistry Benches in ISO Class 5 Cleanroom

Offering main image Wet chemical processing (etching) of layers on wafer surfaces; wet chemical photoresist removal. Standard Clean (SPM-HF-APM); HF; BOE; AZ100 wet resist strip; DI water rinse.

Name

Wet Chemistry Benches in ISO Class 5 Cleanroom

Scientific domain

Semiconductor Technology


 

Microsystems Engineering


 

Nanotechnology


Keywords

MST


 

Semiconductor Technology


 

Wet Etching


 

Cleaning Processes


Home partner institution

Otto von Guericke University Magdeburg


Website

https://www.ovgu.de/unimagdeburg/en/microtechnologysupportunit-p-131854.html

Technical staff available

Yes

Remote access details

false

Equipment

arias GmbH

Open access to updated information database

Yes

Online booking system details

manual calender app