PECVD (Plasma Enhanced Chemical Vapour Deposition) in ISO Class 5 Cleanroom
2-chamber PECVD with microwave heads. Substrate: 100 mm and 150 mm wafer. Gas supply lines: H2, PH3, B2H6, SiH4, SiH2Cl2, NH3, O2 and 3 heated liquid precursor lines with evaporators.Name
PECVD (Plasma Enhanced Chemical Vapour Deposition) in ISO Class 5 CleanroomScientific domain
Semiconductor Technology
Microsystems Engineering
Nanotechnology
Keywords
MST
Semiconductor Technology
Thin Film Depostion
Chemical Vapour Deposition
Plasma Enhanced Processing
Home partner institution
Otto von Guericke University Magdeburg