Hot Plate in ISO Class 5 Cleanroom
Thermal treatment of photoresist to cure it and drive out solvents from the resist. Wafer sizes up to 200 mm; Lift Pins; Proximity-Bake; N2 Purge; quick heat up; programmable heating ramp.Name
Hot Plate in ISO Class 5 CleanroomScientific domain
Semiconductor Technology
Microsystems Engineering
Nanotechnology
Keywords
Lithography
MST
Semiconductor Technology
Home partner institution
Otto von Guericke University Magdeburg