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  2. Spin Coater in ISO Class 5 Cleanroom

Spin Coater in ISO Class 5 Cleanroom

Offering main image Applying photoresist to wafers by rotation or spin coating. Wafer sizes up to 200 mm; a large number of vacuum chucks for a wide variety of substrates flexibly adjustable coating position; adjustable edge bead removal.

Name

Spin Coater in ISO Class 5 Cleanroom

Scientific domain

Semiconductor Technology


 

Microsystems Engineering


 

Nanotechnology


Keywords

Lithography


 

MST


 

Semiconductor Technology


 

spin coating


Home partner institution

Otto von Guericke University Magdeburg


Website

https://www.ovgu.de/unimagdeburg/en/microtechnologysupportunit-p-131854.html

Technical staff available

Yes

Remote access details

false

Equipment

Lab Spin 8, SUSS MicroTec SE

Open access to updated information database

Yes

Online booking system details

manual calender app